Ho, D. Et Al. 2020. Microstructural modulation of organic passivation layers for metal oxide semiconductors to achieve high bias stability. JOURNAL OF MATERIALS CHEMISTRY C , vol.8, no.32 , 11209-11222.

Ho, D., Jeong, H., Minh Nhut Le, M. N. L., USTA, H., Kwon, H., Kim, M., ... Kim, C.(2020). Microstructural modulation of organic passivation layers for metal oxide semiconductors to achieve high bias stability. JOURNAL OF MATERIALS CHEMISTRY C , vol.8, no.32, 11209-11222.

Ho, Dongil Et Al. "Microstructural modulation of organic passivation layers for metal oxide semiconductors to achieve high bias stability," JOURNAL OF MATERIALS CHEMISTRY C , vol.8, no.32, 11209-11222, 2020

Ho, Dongil Et Al. "Microstructural modulation of organic passivation layers for metal oxide semiconductors to achieve high bias stability." JOURNAL OF MATERIALS CHEMISTRY C , vol.8, no.32, pp.11209-11222, 2020

Ho, D. Et Al. (2020) . "Microstructural modulation of organic passivation layers for metal oxide semiconductors to achieve high bias stability." JOURNAL OF MATERIALS CHEMISTRY C , vol.8, no.32, pp.11209-11222.

@article{article, author={Dongil Ho Et Al. }, title={Microstructural modulation of organic passivation layers for metal oxide semiconductors to achieve high bias stability}, journal={JOURNAL OF MATERIALS CHEMISTRY C}, year=2020, pages={11209-11222} }